发明名称 SILICON-BASED FINE PARTICLE, METHOD FOR PRODUCING IT AND THERMOPLASTIC RESIN COMPOSITION CONTAINING FINE PARTICLE
摘要 PROBLEM TO BE SOLVED: To provide a new method for producing polyorganosilsesquioxane fine particles, silicon-based fine particles produced by the method, and a thermoplastic resin composition containing the fine particles. SOLUTION: The method for producing the polyorganosilsesquioxane fine particles comprises steps of (a) mixing an organotrialkoxysilane with an organochlorosilane to produce a mixture having concentration of the organochlorosilane of about 100-2,000 ppm, (b) mixing water with the mixture to obtain a sol solution, and (c) maintaining the pH of the sol solution at about 8-11. The organochlorosilane is represented by formula (I): R<SP>1</SP>Si(OR<SP>2</SP>)<SB>3</SB>(I), wherein R<SP>1</SP>represents a 1-6C alkyl group, a vinyl group or a 5-30C aryl group, and R<SP>2</SP>represents a 1-5C alkyl group. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008127564(A) 申请公布日期 2008.06.05
申请号 JP20070288642 申请日期 2007.11.06
申请人 CHEIL INDUSTRIES INC 发明人 LEE HAN SU;KIM JU SUNG;PARK JIN GYU
分类号 C08G77/24;C08L83/04;C08L101/00;G02B5/02 主分类号 C08G77/24
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