发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT AND MANUFACTURING METHOD THEREOF
摘要 A semiconductor integrated circuit relating to one aspect of the present invention includes a power transistor, at least one or more of first metal patterns functioning as a first electrode of the power transistor and at least one or more of second metal patterns functioning as a second electrode of the power transistor formed in an interlayer insulation film on the transistor, at least one or more of first busses electrically connected to a corresponding first metal pattern of the at least one or more of the first metal patterns, a single second bus electrically connected to the at least one or more of second metal patterns, and a contact pad provided to each of the at least one or more of first busses and the single second bus.
申请公布号 US2008128755(A1) 申请公布日期 2008.06.05
申请号 US20070946282 申请日期 2007.11.28
申请人 FUKAMIZU SHINGO;NABESHIMA YUTAKA;YAMAMOTO YASUNORI 发明人 FUKAMIZU SHINGO;NABESHIMA YUTAKA;YAMAMOTO YASUNORI
分类号 H01L27/088;H01L21/8234 主分类号 H01L27/088
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