发明名称 |
Substrate processing apparatus and substrate processing method |
摘要 |
A substrate processing apparatus includes a chamber, and a cleaning-liquid supply unit that supplies a cleaning liquid containing hydrofluoro ether onto a substrate to be processed placed in the chamber. In the chamber, there is further disposed a gas supply unit that supplies into the chamber a gas for preventing moisture from being adhered to a substrate to be processed, when a cleaning liquid containing hydrofluoro ether is supplied onto the substrate to be processed.
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申请公布号 |
US2008127508(A1) |
申请公布日期 |
2008.06.05 |
申请号 |
US20070984100 |
申请日期 |
2007.11.13 |
申请人 |
OHNO HIROKI;SEKIGUCHI KENJI |
发明人 |
OHNO HIROKI;SEKIGUCHI KENJI |
分类号 |
F26B19/00;F26B21/10;F26B25/08 |
主分类号 |
F26B19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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