发明名称 SEMICONDUCTOR DEVICE AND MANUFACTRUING METHOD THEREOF
摘要 A semiconductor device includes a transistor formed by dividing into a first and a second areas, a source electrode pad connected with a first source region formed in the first area and a second source region formed in the second area, a drain electrode pad connected with a first drain region formed in the first area and a second drain region formed in the second area and a connection line to connect a first gate line and a second gate line, where the connection line being provided in a same layer as the first gate line formed in the first area and the second gate line formed in the second area. A wiring for connecting between nodes of another circuit can be provided over the layer having the connection line provided therein and thus the size of a circuit chip can be reduced.
申请公布号 US2008128830(A1) 申请公布日期 2008.06.05
申请号 US20070840966 申请日期 2007.08.18
申请人 NEC ELECTRONICS CORPORATION 发明人 KOBAYASHI DAISAKU;FUJISHIRO TAKAYOSHI
分类号 H01L27/088;H01L21/8234 主分类号 H01L27/088
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