| 摘要 |
A method for providing CMP slurries for copper CMP that have improved pot life by ameliorating hydrogen peroxide degradation in slurries. The method comprises a composition that has a transition metal content of less than about 5 parts per million (ppm), preferably less than about 2 ppm. Preferably the method comprises a composition containing less than about 2 ppm of yttrium, zirconium, and/or iron.
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