| 摘要 |
An apparatus for blacking a defect pixel is provided to radiate laser beams twice or more to the defect pixel through once scanning of laser, thereby significantly reducing a tact time. In a mask(1), two or more openings(11,12,13) are formed. The openings control a size and shape of a laser beam generated from a laser oscillator to be radiated to a defect pixel. A scanning unit relatively scans/drives the laser oscillator and the mask or the defect pixel as radiating the laser beam. A part or the whole of the openings formed in the mask is overlapped on a scan path. Therefore, laser beams are substantially radiated twice or more to the defect pixel even through once scanning of laser. An output pulse of a laser beam is at less than a nano second. |
