| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition, which has a proper pattern shape and pattern collapse, and is improved in sensitivity with respect to EUV light exposure and in dissolution contrast, a compound used for the photosensitive composition, and a pattern-forming method that uses the photosensitive composition; and to provide a photosensitive composition, which is proper in these performances, even in liquid immersion exposure and is suitable for liquid immersion exposure, a compound used for the photosensitive composition, and a pattern-forming method that uses the photosensitive composition. <P>SOLUTION: The photosensitive composition is represented by a specific general formula and contains a polysulfonium salt, having at least one aromatic group having heteroatoms. A compound used for the photosensitive composition and a pattern-forming method that uses the photosensitive composition are also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
