| 摘要 |
PROBLEM TO BE SOLVED: To enable high-speed process of substrates with less number of lots by increasing the number of carriers without increment in apparatus size. SOLUTION: The substrate carrying apparatus includes a carrier station S1 for carrying in or out a carrier 20 for accommodating a wafer W, a processing station S2, and a wafer carrying means. The carrier station in this apparatus is provided with a carrier setter 10 including a plurality of stages of setting racks 11, 12 for setting the carrier, a carrier stock 13, a carrier lifter 14 for sending and receiving the carrier between the carrier setter and the carrier stock, and a transfer arm C for inputting and outputting the wafer to and from the carrier of the carrier setter. A lower setting rack 12 of the carrier setter is moved to the lower location of the upper setting rack and the external location not interfering the longitudinal direction for the upper setting rack 11 with a moving mechanism. Moreover, the lower setting rack sends and receives the carrier, with the carrier lifter, to and from the lower setting rack provided at the external location. COPYRIGHT: (C)2008,JPO&INPIT |
