发明名称 SUBSTRATE TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide substrate treatment equipment which eliminates an impact on a control portion by electric discharge in a bellows pump. SOLUTION: The bellows pump 4 includes cylinder heads 41 which are arranged so as to oppose each other at an interval, a pump head 42 arranged at a center between these cylinder heads 41, and cylinders 43 intervened between each cylinder head 41 and the pump head 42. Moving members 46 and bellows 47 which expand and contract accompanied by movements of the moving members 46 are arranged in each cylinder 43. Moreover, two terminals 58 of a liquid spill sensor 24 are arranged on each cylinder head 41. The terminals 58 have electrode rods 59 which penetrate the cylinder heads 41, and protrusions 66 which protrude in the longitudinal direction of the electrode rods 59 are formed at tip arranged in the cylinders 43 of the electrode rods 59. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008130928(A) 申请公布日期 2008.06.05
申请号 JP20060316051 申请日期 2006.11.22
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KAGIYAMA TETSUO;INOUE HIDEKAZU
分类号 H01L21/304;F04B43/08 主分类号 H01L21/304
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