发明名称 Semiconductor device and manufacturing method thereof
摘要 A semiconductor device having a semiconductor substrate, at least one of a protruding electrode and wiring formed on one surface of the semiconductor substrate, and a first resin film formed on this surface. The first resin film has elasticity low enough to reduce stress induced by a difference in thermal expansion coefficient between the semiconductor substrate and the first resin film. A second resin film, having higher elasticity or higher strength than the first resin film, may be formed on the other surface of the semiconductor substrate.
申请公布号 US2008128906(A1) 申请公布日期 2008.06.05
申请号 US20080003892 申请日期 2008.01.03
申请人 ROHM CO., LTD 发明人 SHIBATA KAZUTAKA
分类号 H01L23/48;H01L21/301;H01L23/29;H01L23/31;H01L23/485 主分类号 H01L23/48
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