Illumination lens for an EUV projection microlithography, projection exposure apparatus and method for manufacturing microstructured component

摘要

The optics (6) has a facet mirror (10) including a set of facets configured to generate a defined illumination setting in an illumination field, where each facet is allocated to a partial beam of radiation. The facet mirror includes sub-units, which are made of facet groups. A changing device (44) interchanges one of the sub-units of the facet mirror against an interchangeable sub-unit. A pupil facet mirror (13) is located in a vicinity of secondary light sources generated by the facet mirror, where the pupil facet mirror images the facet mirror in a reticle plane. Independent claims are also included for the following: (1) a method for production of a micro-structured component (2) a micro-structured component.