| 摘要 |
A gas spray apparatus is provided to spray high pressure gas to a substrate at a setup angle, thereby preventing transfer delay or stop of the substrate transferred by a conveyance device. A main body is disposed in an upper part of a transferred substrate(101). A gas supply pipe(142) supplies gas to the main body. A nozzle(140) is formed in the main body and sprays gas to the substrate. A direction of the nozzle makes a setup angle toward a vertical direction of the surface of the substrate. The main body comprises a first main body and a second main body. The second main body is formed within the first main body, and forms a path for flowing gas between the first main body and the nozzle. |
