发明名称 METHOD FOR CHAMBER CONDITION MONITORING USING QUADRUPOLE MASS SPECTROMETRY
摘要 A chamber condition monitoring method using a quadrupole mass spectrometer is provided to reduce a manufacturing time by performing a seasoning process or monitoring a change of states. A measuring process is performed to measure dissociated ions or mass and energy distribution of reaction kinds of plasma, and density of radicals by using a quadrupole mass spectrometer. A producing process is performed to produce relative distribution of the dissociated ions, and an ionization ratio of the plasma by using the measured results. The ionization ratio of the plasma, the relative distribution and ratio of the dissociated ions, and the density of the radicals are with a normal state of a plasma apparatus(S340). A seasoning process for the process chamber is performed to change a produced value to a normal range when the determined result exceeds the normal range(S350-S380).
申请公布号 KR100835379(B1) 申请公布日期 2008.06.04
申请号 KR20060123992 申请日期 2006.12.07
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 KIM, GWAN HA;ROH, TAE MOON;KIM, JONG DAE;KIM, SANG GI;KOO, JIN GUN
分类号 H01L21/02 主分类号 H01L21/02
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