发明名称 |
Method of manufacturing a projection objective and projection objective manufactured by that method |
摘要 |
A method of manufacturing a projection objective including the steps of defining an initial design for a projection objective and optimizing the design using a merit function having a plurality of merit function components (AB,IRRAD EFF ), each of which reflects a particular quality parameter. One of that merit function components defines a maximum irradiance requirement requiring that a normalized effective irradiance value representing an effective irradiance (IRRAD EFF ) normalized to an effective irradiance in an image surface of the projection objective does not exceed a predefined irradiance threshold value (IRRTV) on each optical surface of the projection objective except for a last optical surface directly adjacent to an image surface of the projective objective. Optical surfaces positioned within caustic regions and/or critically small effective sub-apertures on optical surfaces are thereby systematically avoided. |
申请公布号 |
EP1927890(A1) |
申请公布日期 |
2008.06.04 |
申请号 |
EP20060024789 |
申请日期 |
2006.11.30 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
FELDMANN, HEIKO;GRUNER, TORALF;EPPLE, ALEXANDER |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|