发明名称 BUBBLE JET CLEANING UNIT
摘要 A bubble jet cleaning unit is provided to improve capability of cleaning the substrate seated on a stage by extending nozzles enough to cover diagonal length of the substrate so that nozzles clean overall surface of a substrate when the stage is rotated. A bubble jet cleaning unit has a tank(132) for storing and supplying de-ionized water, a CDA(Clean Dry Air) generator(134), a supply line(136) for delivering de-ionized water and clean dry air, and a nozzle unit(140) for spraying cleaning solution to the substrate(102) placed on a stage(110). The nozzle unit placed above the substrate includes bubble jet nozzles(142) spraying cleaning agent to the substrate and a supply line(144) having enough length to cover diagonal length of the substrate.
申请公布号 KR20080049276(A) 申请公布日期 2008.06.04
申请号 KR20060119668 申请日期 2006.11.30
申请人 LG DISPLAY CO., LTD. 发明人 CHO, WON JIN
分类号 B08B3/02;B08B3/08 主分类号 B08B3/02
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