发明名称 PATTERN FORMING METHOD AND CIRCUIT BOARD
摘要 <p>A pattern forming method and a circuit board are provided to shorten the time for forming a pattern by heating a substrate at a predetermined surface temperature. A pattern forming method includes a process for discharging droplets of a functional fluid including a functional material towards a substrate and forming a pattern on a surface of the substrate. The pattern forming method further includes a first process for heating a surface of the substrate at the surface temperature. The surface temperature is equal to or more than the temperature of the functional fluid in a discharging state and is less than a boiling point of a liquid composition included in the functional fluid. The pattern forming process further includes a second process for discharging the droplets of the functional fluid onto the substrate and forming a pattern while the substrate is heated at the surface temperature.</p>
申请公布号 KR20080048939(A) 申请公布日期 2008.06.03
申请号 KR20070120654 申请日期 2007.11.26
申请人 SEIKO EPSON CORPORATION 发明人 TOYODA NAOYUKI
分类号 H01L21/027 主分类号 H01L21/027
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