COATING FILM FORMING APPARATUS AND COATING FILM FORMING METHOD

摘要

A coating film forming apparatus and a coating film forming method are provided to prevent defocus due to particles on a rear surface of a substrate by inspecting a state of the particles on the rear surface and an edge of a substrate. A processing unit includes one or more coating units for applying a resist film or applying the resist film and an additional film on a substrate, and one or more thermally processing units for performing a thermal process necessary for forming the coating film on the substrate. A pre-coating cleaning unit cleans at least a rear surface and an edge of the substrate before transferring the substrate into the processing unit. A pre-coating check unit checks a state of a rear surface and an edge of the substrate before transferring the substrate into the processing unit. A control unit(20) inspects the substrate before the coating process, determines a state of particles in the rear surface and the edge of the substrate on the basis of the inspected results, and transfers the substrate according to the determined results.