| 摘要 |
<p>An exposure apparatus, an exposure method, and a device fabrication method are provided to detect easily foreign materials by checking a variation of the amount of light. An illumination optic system(30) illuminates a reticle(40) by using light flux of from a light source(12). A projection optic system(50) projects a pattern of the reticle on a substrate. A measurement unit(80) measures the distribution of the amount of light within an exposure region with respect to an upper surface of the projection optic system. A detection unit detects foreign materials from the illumination optic system and the projection optic system on the basis of the distribution of the amount of light measured by the measurement unit.</p> |
