发明名称 |
Schottky diode with low leakage current and fabrication method thereof |
摘要 |
A low leakage Schottky diode and fabrication method thereof. The Schottky diode includes a n-type semiconductor; an anode having a circular periphery formed in a region above the n-type semiconductor; and a cathode formed in a region above the n-type semiconductor and having a pattern surrounding and set apart from the outer periphery of the anode. Because there are no edges at the anode and cathode interface, leakage current is minimized.
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申请公布号 |
US7382035(B2) |
申请公布日期 |
2008.06.03 |
申请号 |
US20060356125 |
申请日期 |
2006.02.17 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SHIM DONG-SIK;MIN YOUNG-HOON;SONG IL-JONG;KU JA-NAM;CHOI HYUNG |
分类号 |
H01L29/47 |
主分类号 |
H01L29/47 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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