发明名称 |
Method for the production of an integrated circuit bar arrangement comprising a metal nitride layer and integrated circuit arrangement |
摘要 |
The document explains, inter alia, a method in which a titanium nitride layer is removed by wet chemical means ( 106 ). Following removal of the titanium nitride, further metallization strata are produced ( 114 ). The result is an integrated circuit arrangement having connections which have a low electrical resistance. The circuit arrangement is particularly suitable for the purpose of switching high powers.
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申请公布号 |
US7381645(B2) |
申请公布日期 |
2008.06.03 |
申请号 |
US20050148861 |
申请日期 |
2005.06.09 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
GOELLNER REINHARD;OBERMEIER HERBERT |
分类号 |
H01L21/44;H01L21/4763;H01L21/768 |
主分类号 |
H01L21/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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