发明名称 Method for the production of an integrated circuit bar arrangement comprising a metal nitride layer and integrated circuit arrangement
摘要 The document explains, inter alia, a method in which a titanium nitride layer is removed by wet chemical means ( 106 ). Following removal of the titanium nitride, further metallization strata are produced ( 114 ). The result is an integrated circuit arrangement having connections which have a low electrical resistance. The circuit arrangement is particularly suitable for the purpose of switching high powers.
申请公布号 US7381645(B2) 申请公布日期 2008.06.03
申请号 US20050148861 申请日期 2005.06.09
申请人 INFINEON TECHNOLOGIES AG 发明人 GOELLNER REINHARD;OBERMEIER HERBERT
分类号 H01L21/44;H01L21/4763;H01L21/768 主分类号 H01L21/44
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