ATMOSPHERIC PRESSURE PLASMA SURFACE TREATMENT APPARATUS AND ATMOSPHERIC PRESSURE PLASMA SURFACE TREATMENT METHOD

摘要

A plasma processing apparatus and a plasma surface processing method are provided to process rapidly a surface of a substrate by optimizing an arrangement of plasma generation units. A plasma generation unit(100) includes a first gas housing(110) for storing temporarily a process gas. A second plasma generation unit(200) includes a second gas housing(210) for storing temporarily the process gas. An edge of a plasma generation part of the second gas housing comes in contact with an edge of a plasma generation part of the first gas housing. The second plasma generation unit is positioned at a place which is symmetrical to the first plasma generation unit. The first and second generation units move to perform a surface process.