CENTER RING AND INDUCTIVELY COUPLED PLASMA DECOMPOSITION DEVICE PROVIDED WITH THIS

摘要

PROBLEM TO BE SOLVED: To provide technology capable of protecting an inner wall near an opening of a reaction pipe in which plasma is generated and easily performing maintenance. SOLUTION: The center ring 1 has a first circular ring part 2 having an O ring attachment groove 5 on an outer peripheral surface; and two second circular ring parts 3 adjacent to both sides in an axial direction of the circular ring of the first circular ring part 2 respectively in order to position/connect the axis of two pipes while retaining vacuum. One second circular ring part 3b adjacent to the first circular ring part 2 is formed such that an outer diameter is equal to that of the other second circular ring part 3a and an inner diameter is smaller than that of the other second circular ring part 3a, and is provided with a projection part 4 on the whole peripheral edge of an inner peripheral surface in a direction parallel to the axis of the circular ring. COPYRIGHT: (C)2008,JPO&INPIT