发明名称 FORMALDEHYDE FREE ELECTROLESS COPPER COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a formaldehyde free electroless copper plating composition which is formaldehyde free and is environmentally friendly, and also is stable and provides uniform copper deposits, and to provide an electroless copper plating method. SOLUTION: The electroless copper plating composition comprises: one or more sources of copper ions; one or more chelating agents chosen from hydantoin and hydantoin derivatives of 20 to 150 g/L; and pyruvaldehyde as a reducing agent of 10 to 100 g/L. Also, disclosed is an electroless copper plating method for a printed circuit board including a plurality of through-holes using the composition. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008121107(A) 申请公布日期 2008.05.29
申请号 JP20070178610 申请日期 2007.07.06
申请人 ROHM & HAAS ELECTRONIC MATERIALS LLC 发明人 POOLE MARK A;COBLEY ANDREW J;SINGH AMRIK;HIRST DEBORAH V
分类号 C23C18/40;H05K3/18 主分类号 C23C18/40
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