| 摘要 |
<p>In an electron beam irradiating device (1), an electron beam (EB), as emitted from an electron beam gun (10), is focused, when it passes through an electron beam passing hole (2), by a focusing coil (6<SUB>2</SUB>), and is deflected in a Y-axis direction by a deflecting coil (7), so that it irradiates an electron beam penetrating unit (20) having a plurality of electron beam penetrating members (21) arranged in the Y-axis direction. Here, in a Z-axis direction, the shape of the electron beam emitting portion of a cathode (11) and the shape of the electron beam penetrating portions of the electron beam penetrating members (21) are in substantially similar relations to each other. Therefore, the electron beam (EB), as emitted from the electron beam emitting portion, can be so focused on the focusing coil (6<SUB>2</SUB>) that the image of the electron beam (EB) to irradiate the electron beam penetrating members (21) may have substantially the same shape as that of the electron beam penetrating portions in the Z-axis direction.</p> |
