VERTICAL HEAT TREATMENT BOAT AND SEMICONDUCTOR WAFER HEAT TREATMENT METHOD USING THE SAME

摘要

Provided is a vertical heat treatment boat having at least a plurality of supporting posts and a pair of board-like members connected to the both end sections of each supporting post. A plurality of supporting sections for horizontally supporting a substrate to be treated are formed on each supporting post, and supporting auxiliary members whereupon the substrates to be treated are to be placed one by one are removably mounted on the supporting sections. The inclination of the surface of the supporting auxiliary member whereupon the substrate is to be placed is adjusted for each supporting section, by working a surface mounted on the supporting section in accordance with the shape of each supporting section or by having a spacer between the supporting section and the supporting auxiliary member. Thus, the low-cost and easily improved vertical heat treatment boat which prevents generation of slip dislocation due to inclination of each supporting section at the time of heat-treating the substrate by the vertical heat treatment furnace is provided.