| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask for negative exposure which permits production of a photocuring type pattern without peeling the pattern, and a photocuring type pattern produced using the same. <P>SOLUTION: The photomask 21 for negative exposure includes an objective pattern 24 and a dummy pattern 25, wherein the objective pattern 24 comprises openings 22 and light shielding portions 23, and the dummy pattern 25 is disposed in such a way that it comes in contact with at least one side of the objective pattern 24. <P>COPYRIGHT: (C)2008,JPO&INPIT |
