发明名称 |
ELECTRON BEAM IRRADIATION SYSTEM |
摘要 |
<p>In an electron beam irradiation system, a sample (4) housed in a chamber (2) is irradiated with an electron beam (E) and the energy of the electron beam, with which the sample (4) is irradiated, is measured by an electron beam detector (7). The detection surface (7a) of the electron beam detector (7) is covered with a conductive light-shielding film (7b), so that, when the electron beam detector (7) detects the electron beam (E), the effects of visible light, ultraviolet, and other light in the chamber (2) are eliminated. This enables the energy of the electric beam, with which the sample (4) is irradiated, to be accurately measured.</p> |
申请公布号 |
WO2008062670(A1) |
申请公布日期 |
2008.05.29 |
申请号 |
WO2007JP71608 |
申请日期 |
2007.11.07 |
申请人 |
HAMAMATSU PHOTONICS K.K.;HARAGUCHI, DAI;UCHIYAMA, KEIGO;MATSUMURA, TATSUYA |
发明人 |
HARAGUCHI, DAI;UCHIYAMA, KEIGO;MATSUMURA, TATSUYA |
分类号 |
B01J19/12;G21K5/04;G01T1/24;H01J37/244;H01L21/027 |
主分类号 |
B01J19/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|