发明名称 MAGNETORESISTIVE MEMORY, AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an MRAM using magnetic tunnel elements capable of manufacturing an insulating film with few defects by supplying to the film a sufficient oxygen by ozone during forming an oxide film obtained by oxidizing metal aluminum in a mixed gas containing oxygen and ozone, without giving damage to the obtained oxide film. SOLUTION: In a magnetic tunnel element 8 having a hard magnetic film 5 and a soft magnetic film 7 having mutually different coercive forces and an insulating film 6 interposed between them, the insulating film 6 is formed by oxidizing an Al film in the mixed gas of oxygen and ozone. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008124488(A) 申请公布日期 2008.05.29
申请号 JP20070333360 申请日期 2007.12.25
申请人 YAMAHA CORP 发明人 HORIAI SUNAO;ENDO HIROSHI;HAYASHI TAKAHIRO
分类号 H01L43/12;H01L21/8246;H01L27/105;H01L43/08 主分类号 H01L43/12
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