| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an optical constant calculation method which enables the calculation of an accurate optical constant with respect to a substrate film and capable of accurately specifying the surface structure of a substrate. <P>SOLUTION: The reflectivity of an oxidation film 33 under which an organic insulating film 32 is formed after respective films are stacked in a wafer W and the reflectivity of the organic insulating film 32 exposed after the oxidation film 33 is removed by plasma is measured. The optical constant of the organic insulating film 32 deteriorated by heat treatment and the optical constant of the organic insulating film 32 deteriorated by plasma are calculated on the basis of these reflectivities. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
