发明名称 Optical element, exposure apparatus using the same, and device manufacturing method
摘要 There is disclosed an optical element, comprising, a supporting substrate, a multilayer film being supported on the substrate and reflecting extreme ultraviolet light, and an alloy layer provided between the multilayer film and the substrate.
申请公布号 US2008123073(A1) 申请公布日期 2008.05.29
申请号 US20070984616 申请日期 2007.11.20
申请人 NIKON CORPORATION 发明人 SHIRAISHI MASAYUKI;MURAKAMI KATSUHIKO
分类号 G03B27/54;G02B5/08 主分类号 G03B27/54
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