ROBOT CALIBRATION SYSTEM AND METHOD FOR WAFER HANDLING ROBOTS IN A CMP SYSTEM

摘要

A robot calibration system and method for robots in semiconductor wafer processing systems is disclosed. The calibration system comprises a calibration array, a dummy wafer and a control system programmed with a calibration routine. The calibration array has a plurality of inductive proximity sensors to determine parallelism of the robot relative to a station and a center-locating sensor to determine the center of the station.