发明名称 EXPOSURE METHOD AND APPARATUS, IMMERSION MEMBER, MAINTENANCE METHOD FOR EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To suppress liquid from spreading during exposure by an immersion method even if a liquid that easily fits with an object or a liquid that has no appropriate liquid-repellent coat is used. <P>SOLUTION: The exposure method for exposing a substrate P with an exposure light via an optical member 2 and a liquid LQ comprises: a first step of forming an immersion space between the optical member 2 and substrate P by supplying the liquid LQ to the inside of a nozzle member 70 that is disposed to surround a light path of the exposure light, tubular, and is formed with an inclined plane 72A with an acute angle on a lateral surface of one end side opposite to which the substrate P is disposed; and a second step of holding at least part of the liquid LQ that leaks out of the nozzle member 70 by the inclined plane 72A. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008124283(A) 申请公布日期 2008.05.29
申请号 JP20060307266 申请日期 2006.11.13
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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