| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid-immersion exposure apparatus which reduces restriction on movement patterns of a stage due to movement of a liquid on a substrate held with a certain stage to a substrate to be held with another stage. <P>SOLUTION: The liquid-immersion exposure apparatus has a plurality of stages 45 each having a substrate chuck and a substrate surrounding member 41 and movable in a region including an exposure region and a measurement region, and a stage control section for controlling the driving of the stages 45. A mirror 56 for reflecting a measured light from an interferometer is provided on a first side surface of each stage, and the surrounding member 41 includes a protruding portion 42 protruding in a normal line direction of the first side surface from a mirror 56 provided on the first side surface. A stage control section controls the stages 45 so that after exposure of a substrate 40 held on a stage 45 positioned in the exposure region, at least a part of a liquid on the substrate 40 can move to a substrate 40 held in another stage 45 through the upper part of a protruding portion 42 of the stage 45. <P>COPYRIGHT: (C)2008,JPO&INPIT |
