发明名称 SURFACE ACOUSTIC WAVE DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a surface acoustic wave device having proper frequency temperature characteristics, a large electro-mechanical coupling coefficient, and small propagation loss. SOLUTION: A surface acoustic wave device 1 comprises a piezoelectric substrate 2 made with 17°-58°rotated Y plate X propagation LiTaO<SB>3</SB>, an IDT 3 composed of tantalum, and a SiO<SB>2</SB>film formed on the piezoelectric substrate 2 to cover IDT 3. The standard film thickness H/λof the IDT 3 is within the range of 0.004-0.055, and the standard film thickness Hs/λof the SiO<SB>2</SB>film is within the range of 0.10-0.40, where H is the film thickness andλis the wavelength of surface waves. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008125130(A) 申请公布日期 2008.05.29
申请号 JP20080029469 申请日期 2008.02.08
申请人 MURATA MFG CO LTD 发明人 KADOTA MICHIO
分类号 H03H9/145;H03H3/08;H03H9/25 主分类号 H03H9/145
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