发明名称 INSPECTION EQUIPMENT AND INSPECTION METHOD OF LIQUID CRYSTAL DISPLAY THIN FILM TRANSISTOR ARRAY SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an inspection method in which problems associated with product reliability and those associated with manufacturing steps are reflected at an early stage, by detecting an influence of a photo-electric effect on a thin film transistor at an early stage. <P>SOLUTION: The inspection method is applied to an inspection of defects in a liquid crystal display thin film transistor array substrate, and includes: providing inspection equipment which comprises a chamber, a platform, a light emission mechanism, and an electrical characteristics testing mechanism placed in the chamber; placing the liquid crystal display thin film transistor array substrate on the platform; irradiating the liquid crystal display thin film transistor array substrate with light by using the light emission mechanism; and inspecting electrical characteristics of the liquid crystal display thin film transistor array substrate after irradiation with the light emission mechanism by using the electrical characteristics testing mechanism. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008122893(A) 申请公布日期 2008.05.29
申请号 JP20070001965 申请日期 2007.01.10
申请人 AU OPTRONICS CORP 发明人 CHIN KEISHI;CHIN SHISHO
分类号 G02F1/13;G02F1/1368;G09F9/00;H01L29/786 主分类号 G02F1/13
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