发明名称 HYDRAULIC-FACILITATED CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD
摘要 A contact lithography apparatus 100, 220, a system 200 and a method 300 use a hydraulic deformation to facilitate pattern transfer. The apparatus, the system and the method include a spacer 120, 226 that provides a spaced apart proximal orientation of lithographic elements 110, 228a, 130, 228b, and a hydraulic force member 140, 240 that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.
申请公布号 WO2008045504(A3) 申请公布日期 2008.05.29
申请号 WO2007US21722 申请日期 2007.10.10
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.;GAO, JUN;WU, WEI;PICCIOTTO, CARL 发明人 GAO, JUN;WU, WEI;PICCIOTTO, CARL
分类号 G03F7/00;G03F7/20 主分类号 G03F7/00
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