PATTERN FORMING APPARATUS

摘要

PROBLEM TO BE SOLVED: To suppress the unevenness of a pattern formed on a substrate by using a nozzle part.

SOLUTION: In a pattern forming apparatus, the nozzle part 421 and a light irradiation part 43 are moved continuously and relatively to the substrate 9 to make the nozzle part 421 precede in the moving direction along the substrate 9 while a pattern forming material 80 having light curing property is discharged from a plurality of discharge ports 422 of the nozzle part 421 and a mask 46 is moved parallel to the substrate 9 between the light irradiation part 43 and the substrate 9 by a mask moving mechanism 45. The illuminance distribution of irradiation light in the irradiating zone on the substrate 9 is irregularly changed with time because the a plurality of rectangular zones where the respective transmissivity is irregularly different are two-dimensionally arranged and set on the mask 46. As a result, the unevenness of the pattern of a lib formed when the libs each having different width are mixed on the substrate 9 due to the unevenness or the like of a plurality of the discharge ports is suppressed.

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