| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a display device which is high in yield and is high in reliability and a method for manufacturing the same. <P>SOLUTION: The display device includes a substrate 1, a capacitor lower electrode 20 having a polycrystalline silicon film 4 formed on the substrate 1, and a contact metal film 5 disposed on the polycrystalline silicon film 4, a gate insulation film 6 formed on the capacitor lower electrode 20, and a gate metal electrode 7 formed in a position facing the capacitor lower electrode 20 on the gate insulation film 6. The gate metal electrode 7 is formed on an inner side of the capacitor lower electrode 20 in top view. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
