发明名称 Hafnium lanthanide oxynitride films
摘要 Electronic apparatus and methods of forming the electronic apparatus include a hafnium lanthanide oxynitride film on a substrate for use in a variety of electronic systems. The hafnium lanthanide oxynitride film may be structured as one or more monolayers. Metal electrodes may be disposed on a dielectric containing a hafnium lanthanide oxynitride film.
申请公布号 US2008124907(A1) 申请公布日期 2008.05.29
申请号 US20060515143 申请日期 2006.08.31
申请人 MICRON TECHNOLOGY, INC. 发明人 FORBES LEONARD;AHN KIE Y.;BHATTACHARYYA ARUP
分类号 H01L21/316;H01L21/28 主分类号 H01L21/316
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