发明名称 HF-Plasmaversorgungseinrichtung
摘要 <p>The method involves coupling the high frequency (HF) signals from a HF generator (6) and dividing the coupled signals into plasma power and compensation power. The level and phase position of the high frequency power signals is adjusted such that a portion of coupled HF power represents a compensation power for the plasma lines in the region between the lower power limit and the actual power output. A portion of the coupled HF-power represents the compensation power for the plasma power within the provided lower power limit. An independent claim is included for an HF plasma supply device.</p>
申请公布号 DE502005003768(D1) 申请公布日期 2008.05.29
申请号 DE20055003768T 申请日期 2005.10.17
申请人 HUETTINGER ELEKTRONIK GMBH & CO. KG 发明人 KIRCHMEIER, THOMAS;GLUECK, MICHAEL;GERHARDT, CHRISTOPH;MANN, EKKEHARD;HOFSTETTER, CHRISTOPH;HINTZ, GERD
分类号 H03H11/30;H01J37/32 主分类号 H03H11/30
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