发明名称 |
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof |
摘要 |
Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.
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申请公布号 |
US2008124650(A1) |
申请公布日期 |
2008.05.29 |
申请号 |
US20070906391 |
申请日期 |
2007.10.02 |
申请人 |
ANGELOPOULOS MARIE;BABICH KATHERINA E;LATULIPE DOUGLAS CHARLES;LIN QINGHUANG;MEDEIROS DAVID R;MOREAU WAYNE MARTIN;PETRILLO KAREN E;SIMONS JOHN P |
发明人 |
ANGELOPOULOS MARIE;BABICH KATHERINA E.;LATULIPE DOUGLAS CHARLES;LIN QINGHUANG;MEDEIROS DAVID R.;MOREAU WAYNE MARTIN;PETRILLO KAREN E.;SIMONS JOHN P. |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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