| 摘要 |
PROBLEM TO BE SOLVED: To precisely measure the thickness of a thin film on the surface of an object of film formation. SOLUTION: Thin films are made to grow on the surfaces of a calibrating crystal oscillator 1 and a measuring crystal oscillator 2, and their film thicknesses are measured beforehand. In a film forming process, the thickness of a film on the surface of the object 15 of film formation is acquired by multiplying a measurement value P of the measuring oscillator 2 by C/M being the ratio of measurement values in a calibration process. It does not matter if a sound impedance ratio Z of the measuring crystal oscillator acquired from the resonance frequencies of the calibrating oscillator 1 and the measuring oscillator 2, to acquire the precise film thickness. COPYRIGHT: (C)2008,JPO&INPIT |
