发明名称 SELF-ALIGNED GATE ISOLATION
摘要 Embodiments of the invention include a circuit with a transistor having a self-aligned gate. Insulating isolation structures may be formed, self-aligned to diffusions. The gate may then be formed self-aligned to the insulating isolation structures.
申请公布号 KR20080047453(A) 申请公布日期 2008.05.28
申请号 KR20087008820 申请日期 2006.07.27
申请人 INTEL CORP. 发明人 CHANG PETER
分类号 H01L21/8234;H01L21/8238;H01L27/11 主分类号 H01L21/8234
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