发明名称 POLISHING COMPOSITION AND POLISHING PROCESS
摘要 A polishing composition, and a method for polishing a silicon oxide or silicon nitride layer on a polysilicon layer by using the composition are provided to improve the polishing selectivity of a silicon oxide or silicon nitride layer to a polysilicon layer. A polishing composition comprises an abrasive grain selected from silica and ceria; an alkali selected from ammonia, ammonium salts, alkali metal salt and alkali metal hydroxides; and an organically modified silicone oil selected from polyoxyethylene modified silicone oil, poly(oxyethylene oxypropylene) modified silicone oil, epoxy/polyether modified silicone oil and amino/polyether modified silicone oil.
申请公布号 KR20080047291(A) 申请公布日期 2008.05.28
申请号 KR20070120041 申请日期 2007.11.23
申请人 FUJIMI INCORPORATED 发明人 SHIMIZU MIKIKAZU;NAKAJIMA TAKEHIKO;ITO TAKASHI;HIRAMITSU AI
分类号 C09K3/14;B24B37/00;H01L21/304 主分类号 C09K3/14
代理机构 代理人
主权项
地址