发明名称 Illumination system and projection display apparatus
摘要 <p>An illumination system (700) is provided. The illumination system (700) divides a light flux emitted from a light source (722) into a plurality of partial light fluxes and causes the plurality of partial light fluxes to be substantially superimposed on an illumination area (80), so as to enable a light-entering face of a specific optical apparatus to be illuminated as the illumination area. The illumination system comprises a light source (722) that has a reflector (724) that emits a convergent light flux, and a dividing and superimposing section (730, 740, 750, 770) that divides the convergent light flux into a plurality of partial light fluxes and causes the plurality of partial light fluxes to be substantially superimposed on the illumination area (80). The illumination system further comprises a light flux contraction section (724, 730, 770) that changes an incident light flux to an emitting light flux, the emitting light flux having a width narrower than the incident light flux. The light flux contraction section has a light condensing function and a light parallelizing function and a function of an afocal optical system, and the reflector has the light condensing function and the dividing and superimposing section has the light parallelizing function.</p>
申请公布号 EP1772766(B1) 申请公布日期 2008.05.28
申请号 EP20060022597 申请日期 1998.11.02
申请人 SEIKO EPSON CORPORATION 发明人 OGAWA, YASUNORI
分类号 G02B5/02;G02B27/09;G02B27/00;G02B27/18;G02F1/13;H04N5/74;H04N9/31 主分类号 G02B5/02
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