| 摘要 |
A chemical vapor deposition apparatus for a flat display is provided to maintain flatness of a gas distribution plate on a susceptor more effectively as preventing the gas distribution plate from drooping, thereby forming a uniform deposition layer on a glass substrate. On a susceptor(30), a glass substrate as a deposition process object is loaded. A gas distribution plate(17) is disposed on the susceptor, and distributes reactive gas so as for a deposition layer to be formed on the surface of the glass substrate. A drooping preventing unit(50) is coupled with the gas distribution plate to prevent the gas distribution plate from drooping during the deposition process. The drooping preventing unit comprises the following parts. At least one reinforcing panel(60) is coupled with one side of the gas distribution plate in parallel on the gas distribution plate. At least one panel supporting unit(80) supports the gas distribution plate on the reinforcing panel so as for the reinforcing panel to form force in a direction opposite to a direction in which the gas distribution plate droops. |
