METHOD AND APPARATUS FOR PRODUCING PROTECTIVE FILM

摘要

An apparatus for manufacturing a protective layer includes a film-forming chamber (32); gas inlets (47) for introducing at least gas into the film-forming chamber (32); exhaust pumps (43) for evacuating the film-forming chamber (32); a cryotrap for controlling the exhaust velocity of water independent of the exhaust pumps (43); and a temperature controller for controlling the cooling temperature of the cryotrap. The exhaust velocity of the water is controlled by the cooling temperature of the cryotrap so as to form a protective layer susceptible to the partial pressure of water always under the same conditions. This results in a protective layer having resistance to sputtering and excellent secondary emission characteristics.