发明名称 |
METHODS FOR CHARACTERIZING DEFECTS ON SILICON SURFACES, ETCHING COMPOSITION FOR SILICON SURFACES AND PROCESS OF TREATING SILICON SURFACES WITH THE ETCHING COMPOSITION |
摘要 |
<p>Methods for characterizing defects on silicon surfaces, etching composition for silicon surfaces and process of treating silicon surfaces with the etching composition The present invention relates to a method for characterizing defects on silicon surfaces, in particular silicon wafers, a method for treating silicon surfaces with an etching solution and the etching solution to be employed in the method and process of the present invention.</p> |
申请公布号 |
SG142223(A1) |
申请公布日期 |
2008.05.28 |
申请号 |
SG20070066764 |
申请日期 |
2007.09.11 |
申请人 |
S.O.I.TEC SILICON ON INSULATOR TECHONOLOGIES |
发明人 |
ABBADIE ALEXANDRA;MAEHLISS JOCHEN;KOLBESEN BERND |
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