发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 An exposure apparatus includes: a supply port through which a liquid is supplied to an optical path space of exposure light; and a supply passage in which the liquid flows and which is in fluid communication with the supply port. An amount of a predetermined substance mixed into the liquid in the supply passage is set to be not greater than a predetermined value.
申请公布号 EP1926127(A1) 申请公布日期 2008.05.28
申请号 EP20060796631 申请日期 2006.08.22
申请人 NIKON CORPORATION 发明人 FUJIWARA, TOMOHARU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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