发明名称 Method for fabricating semiconductor device
摘要 A method for fabricating a semiconductor device for a system on chip (SOC) for embodying a transistor for a logic device, an electrical erasable programmable read only memory (EEPROM) cell and a flash memory cell in one chip is provided. Floating gates of the EEPROM cell and the flash memory cell are formed by using a first polysilicon layer; and a gate electrode of the logic device and control gates of the EEPROM cell and the flash memory cell are formed by using a second polysilicon layer. Thus, it is possible to stably form the logic device, the EEPROM cell and the flash memory cell in one chip.
申请公布号 US7378315(B2) 申请公布日期 2008.05.27
申请号 US20050296117 申请日期 2005.12.06
申请人 MAGNACHIP SEMICONDUCTOR LTD. 发明人 JEONG YONG-SIK
分类号 H01L21/336 主分类号 H01L21/336
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